Dhia Elhak, MessaoudDjezzar, BoualemBenabdelmoumene, AbdelmadjidBoubaaya, MohamedZatout, BoumedieneZitouni, Abdelkader2021-10-042021-10-0420212543-3792DOI: https://doi.org/10.51485/ajss.v6i1.3https://dspace.univ-boumerdes.dz/handle/123456789/7156To measure the entire characteristic of p-MOSFET, we have implemented the fast Ids-Vgs technique. The latter is used to study NBTI phenomenon with measure-stress-measure method, for electric field 5MV/cm < Eox < 7.5MV/cm, and temperatures 27°C < Ts < 120°C. Measurement time has reached 10 us, and a stress-measure delay (switching time) of about a hundred of milliseconds was obtained. However, strengths and weaknesses of the implemented technique have been discussed. Furthermore, the extraction methods: transconductance (Gm), subthreshold slope (SS), and mid-gap (MG), have been implemented and discussed as well. NBTI parameter i.e. Delta Vth, n, gamma and Ea were extracted and compared to other results. A time exponent n of 0.149 has been touched. Activation energy Ea = 0.039 eV and a field factor gamma = 0.41 MV/cm for a stress time ts < 10 s have been obtained.enMOSFET reliabilityNBTII_ds-V_gs fast characterizationMSM methodExtraction methodsArticle