Azibi, MouradSaoula, NadiaAknouche, Hamid2021-03-102021-03-10201913353632DOI: 10.2478/jee-2019-0051https://content.sciendo.com/view/journals/jee/70/7/article-p112.xml?language=enhttps://dspace.univ-boumerdes.dz/handle/123456789/6599In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to -100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarizationen316L stainless steelBias voltageCorrosionRF magnetron sputteringZrNArticle