Naas, Lazhari-AyoubBouaouina, BoudjemaaBensouici, FayçalMokeddem, KamelAbaidia, Seddik-El-Hak2024-03-182024-03-1820240040-6090https://doi.org/10.1016/j.tsf.2024.140275https://www.sciencedirect.com/science/article/abs/pii/S0040609024000774https://dspace.univ-boumerdes.dz/handle/123456789/13709TiO2 monolayer and TiN/TiO2 bilayer coatings were deposited on soda-lime glass prepared by mixing two techniques, TiO2 was deposited by sol-gel dip-coating and TiN film was deposited by oblique angle deposition using reactive magnetron sputtering at α=45° Structural analysis showed typical peaks of TiO2 anatase phase and cubic (Na-Cl type) structure of TiN. Roughness value of 3 nm was obtained for the TiN/TiO2 bilayer film with a rise and elongated grains size. It was found that the optical band gap energy decreases after coupling the TiN sub-layer which is explained by the incorporation of N atoms into TiO2 structure. At constant UV irradiation time, the photo-degradation of methylene blue rate increased for TiN/TiO2 film by 4 % compared to TiO2 filmenBilayerMagnetron sputteringphotocatalytic activitySol-gelThin filmTitanium dioxideTitanium nitrideArticle