Sputter deposition of titanium and nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by rutherford backscattering spectrometry

Salhi, M.Abaidia, Seddik-El-HakMammeri, S.Bouaouina, Boudjemaa2017-06-052017-06-0520170040-6090https://dspace.univ-boumerdes.dz/handle/123456789/3758enOptical emission spectroscopyMagnetron sputteringRutherford backscattering spectrometryGas pressurePower densityAverage deposition rateSputter deposition of titanium and nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by rutherford backscattering spectrometryArticle