Mokeddem, KamelAoucher, M.Smail, T.2018-03-012018-03-0120060749-6036https://dspace.univ-boumerdes.dz/handle/123456789/4575ena-SiN:H filmsSputteringFTIR measurementsMIS structureHydrogenated amorphous silicon nitride deposited by DC magnetron sputteringArticle