A new method of oxide charges densities determination using Charge-Pumping technique in MOS structures

Bentarzi, HamidZitouni, AbdelkaderKribes, Youcef2018-03-062018-03-062008978-960-6766-65-7https://dspace.univ-boumerdes.dz/handle/123456789/4584enOxide chargesCharge pumping techniqueBias thermal stress techniqueFlat-band voltageOxide chargeMobile ionic charge densityOxide trapped charge densityA new method of oxide charges densities determination using Charge-Pumping technique in MOS structuresOther