Behrisch, R.Mayer, M.Jacob, W.Assmann, W.Dollinger, G.Bergmaier, A.Kreissig, U.Friedrich, M.Sun, G.Y.Hildebrandt, D.Akbi, MohamedSchneider, W.Schleubner, D.Knapp, W.Edelmann, C.2015-04-232015-04-2320000022-3115https://dspace.univ-boumerdes.dz/handle/123456789/535The absolute amount of deuterium in amorphous deuterated carbon (a-C:D) layers has been measured by six laboratories with di erent techniques, such as MeV ion beam analysis, secondary ion mass spectrometry (SIMS), and thermal desorption spectrometry (TDS). The a-C:D layers have been deposited from a CD 4 glow discharge plasma onto carbon and silicon substrates. The results for the absolute numbers obtained with the di erent analysing techniques show a scatter of up to about 35% around the average value. These deviations are larger than the errors stated by the experimentalists and indicate possible systematic uncertainties in some of the measurementsenDeuteriumAmorphous deuterated carbon (a-C:D)PlasmaSecondary ion mass spectrometry (SIMS)Article