Publications Scientifiques

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Author: search.filters.author.Aknouche, HamidSubject: search.filters.subject.Corrosion

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    Effects of Nitrogen Content on the Structural, Mechanical, and Corrosion Properties of ZrN Thin Films Grown on AISI 316L by Radiofrequency Magnetron Sputtering
    (Wiley, 2021) Azibi, Mourad; Saoula, Nadia; Madaoui, Noureddine; Aknouche, Hamid
    Zirconium nitride films are deposited onto stainless steel AISI 316L and silicon (100) by radio frequency magnetron sputtering at different nitrogen flow ratios [N2 /(Ar+N2 )] varied between 0 and 0.25). Scanning electron microscope, atomic force microscopy, X-ray diffraction (XRD), and Raman are used to investigate the surface morphology and microstructure of the thin films. The mechanical and electrochemical properties of all coatings are evaluated and compared with the uncoated AISI 316L to explore the efficiency of surface modification. The XRD and Raman analysis show that all the films are crystalline. This shows that the increased nitrogen content leads to a transformation from hexagonal 𝜶-Zr phase to cubic c-Zr and then to mixed 𝜶-Zr and face centered cubic c-ZrN phases. The films deposited with nitrogen flow ratio of 0.2 show the highest hardness of 32.2 GPa. Using the potentiodynamic polarization method, the corrosion behavior of the films is studied in Hank’s solution. The comparison between uncoated and coated substrates shows a decrease in corrosion current density for all coated samples.
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    The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering : biomedical application
    (De Gruyter Open Ltd, 2019) Azibi, Mourad; Saoula, Nadia; Aknouche, Hamid
    In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to -100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization
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    Deposition and characterization of titanium aluminum nitridecoatings prepared by RF magnetron sputtering
    (Elsevier, 2015) Ait Djafer, Amina Zouina; Saoula, Nadia; Aknouche, Hamid; Guedouar, Bendiba