Publications Internationales

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Author: search.filters.author.Saoula, NadiaHas files: No

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    Effect of Ar/N2 flow ratio on the microstructure and mechanical properties of Ti-Cr-N coatings deposited by DC magnetron sputtering on AISI D2 tool steels
    (Elsevier, 2021) Kehal, Abdelkrim; Saoula, Nadia; Abaidia, Seddik-El-Hak; Nouveau, Corinne
    Ti-Cr-N coatings were deposited on Si (100) and AISI D2 tool steel substrates by reactive DC magnetron co-sputtering technique from titanium and chromium target in mixed Ar/N2 atmosphere. The Ar/N2 ratio effects on the chemical composition, structure, morphology, intrinsic stress and mechanical properties of the Ti-Cr-N coatings were investigated. The growing process of Ti-Cr-N coatings can be divided into three stages: Stage I, in poisoning mode (low flow ratio 1 < Ar/N2 ≤ 1.4), Stage II, in transition mode (intermediate flow ratio 1.4 ≤ Ar/N2 ≤ 3) and Stage III in metallic mode (Ar/N2 > 3). For all samples, XRD analysis shown the formation of mixed nitrides phases. In stage I, Ti2N, TiN0.3, and hexagonal-Cr2N phases were observed. In Stage II, TiN0.3, Cr2N, and cubic-TiN phases were formed, while only TiN and Cr2N are observed in stage III. The coatings deposited with Ar/N₂ ratio of 3 shows the largest hardness of 24 GPa which is attribute to the dense structure and smoother surface morphology. The properties of the films are discussed in terms of evolution growth stages resulting by the variation of Ar/N2 flow ratios
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    Bias voltage effect on magnetron sputtered titanium aluminum nitride TiAlN thin films properties
    (EDP Sciences, 2019) Ait-Djafer, Amina Zouina; Saoula, Nadia; Wamwangi, Daniel; Madaoui, Noureddine; Aknouche, Hamid
    In this study, a negative substrate bias voltage is used to tune the structural, morphological, mechanical and electrochemical properties of TiAlN coatings fundamental for protective coating applications. TiAlN thin films have been deposited on glass, (001)Si and stainless steel substrates by RF magnetron sputtering at a power density of 4.41 W/cm2. The deposition rate was determined from X-ray reflectivity measurements to 7.00 ± 0.05 nm/min. TiAlN films used in this work were deposited for 60 min to yield a film thickness of 420 nm. Structural analysis has shown that TiAlN coating forms a cubic (fcc) phase with orientations in (111), (200), (220) and (222) planes. The deposited coatings present maximum hardness (H = 37.9 GPa) at −75 V. The dependence of hardness and Young's modulus and corrosion resistance on microstructure has been established. Electrochemical studies by potentiodynamic polarization in aggressive environment (3.5 wt.% NaCl) have revealed that stainless steel substrate with TiAlN coating exhibits excellent corrosion resistance