The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering : biomedical application
| dc.contributor.author | Azibi, Mourad | |
| dc.contributor.author | Saoula, Nadia | |
| dc.contributor.author | Aknouche, Hamid | |
| dc.date.accessioned | 2021-03-10T10:21:35Z | |
| dc.date.available | 2021-03-10T10:21:35Z | |
| dc.date.issued | 2019 | |
| dc.description.abstract | In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to -100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization | en_US |
| dc.identifier.issn | 13353632 | |
| dc.identifier.uri | DOI: 10.2478/jee-2019-0051 | |
| dc.identifier.uri | https://content.sciendo.com/view/journals/jee/70/7/article-p112.xml?language=en | |
| dc.identifier.uri | https://dspace.univ-boumerdes.dz/handle/123456789/6599 | |
| dc.language.iso | en | en_US |
| dc.publisher | De Gruyter Open Ltd | en_US |
| dc.relation.ispartofseries | Journal of Electrical Engineering/ Vol.70, N°7 (2019); | |
| dc.subject | 316L stainless steel | en_US |
| dc.subject | Bias voltage | en_US |
| dc.subject | Corrosion | en_US |
| dc.subject | RF magnetron sputtering | en_US |
| dc.subject | ZrN | en_US |
| dc.title | The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering : biomedical application | en_US |
| dc.type | Article | en_US |