Optical properties of fluorine doped tin oxide annealed under air

Abstract

Fluorine doped tin oxide thin film was deposited as window layer on diffused mono- crystalline silicon wafers (100) for photovoltaic purposes. At the time of screen printing metallization (1), thin films SnO2: F is confronted to an annealing under air for temperatures beyond 800°C. In order to study the optical properties of this transparent and conductive oxide TCO, thin film SnO2: F is deposited with spray pyrolysis technique on quartz blades to support the annealing of the screen printing metallization at high temperatures. Measured spectra of transmittance and reflectance are obtained by using the characterization by spectrophotometry from the Ultra-Violet to the Near-Infrared range wavelength. One can proceed to the optical parameters calculation by using the numerical and iterative Mueller method (2) to solve the non-linear equations