Effect of TiN thin films deposited by oblique angle sputter deposition on sol-gel coated TiO2 layers for photocatalytic applications

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dc.contributor.authorNaas, Lazhari-Ayoub
dc.contributor.authorBouaouina, Boudjemaa
dc.contributor.authorBensouici, Fayçal
dc.contributor.authorMokeddem, Kamel
dc.contributor.authorAbaidia, Seddik-El-Hak
dc.date.accessioned2024-03-18T08:01:01Z
dc.date.available2024-03-18T08:01:01Z
dc.date.issued2024
dc.description.abstractTiO2 monolayer and TiN/TiO2 bilayer coatings were deposited on soda-lime glass prepared by mixing two techniques, TiO2 was deposited by sol-gel dip-coating and TiN film was deposited by oblique angle deposition using reactive magnetron sputtering at α=45° Structural analysis showed typical peaks of TiO2 anatase phase and cubic (Na-Cl type) structure of TiN. Roughness value of 3 nm was obtained for the TiN/TiO2 bilayer film with a rise and elongated grains size. It was found that the optical band gap energy decreases after coupling the TiN sub-layer which is explained by the incorporation of N atoms into TiO2 structure. At constant UV irradiation time, the photo-degradation of methylene blue rate increased for TiN/TiO2 film by 4 % compared to TiO2 filmen_US
dc.identifier.issn0040-6090
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2024.140275
dc.identifier.urihttps://www.sciencedirect.com/science/article/abs/pii/S0040609024000774
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/13709
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofseriesThin Solid Films/ Vol. 793, Art. N° 140275( 2024);
dc.subjectBilayeren_US
dc.subjectMagnetron sputteringen_US
dc.subjectphotocatalytic activityen_US
dc.subjectSol-gelen_US
dc.subjectThin filmen_US
dc.subjectTitanium dioxideen_US
dc.subjectTitanium nitrideen_US
dc.titleEffect of TiN thin films deposited by oblique angle sputter deposition on sol-gel coated TiO2 layers for photocatalytic applicationsen_US
dc.typeArticleen_US

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