Hydrogenated amorphous silicon nitride deposited by DC magnetron sputtering

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dc.contributor.authorMokeddem, Kamel
dc.contributor.authorAoucher, M.
dc.contributor.authorSmail, T.
dc.date.accessioned2018-03-01T08:06:34Z
dc.date.available2018-03-01T08:06:34Z
dc.date.issued2006
dc.identifier.issn0749-6036
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/4575
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofseriesSuperlattices and Microstructures/ Vol.40, Issues N°4–6 (2006);pp. 598-602
dc.subjecta-SiN:H filmsen_US
dc.subjectSputteringen_US
dc.subjectFTIR measurementsen_US
dc.subjectMIS structureen_US
dc.titleHydrogenated amorphous silicon nitride deposited by DC magnetron sputteringen_US
dc.typeArticleen_US

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