Sizing of the CMOS 6T-SRAM cell for NBTI ageing mitigation

dc.contributor.authorChenouf, Amel
dc.contributor.authorDjezzar, Boualem
dc.contributor.authorBentarzi, Hamid
dc.contributor.authorBenabdelmoumene, Abdelmadjid
dc.date.accessioned2020-12-22T08:42:35Z
dc.date.available2020-12-22T08:42:35Z
dc.date.issued2020
dc.description.abstractThis study presents a negative bias temperature instability (NBTI) mitigation design technique for CMOS 6T-static random access memory (6T-SRAM) cells. The proposed approach is based on transistor sizing technique. It consists of sizing the nMOS access transistors of the cell to alleviate NBTI ageing occurring in its pMOS pull-up transistors threatening the cell stability. Once the access transistors are sized for a better hold static noise margin under NBTI, the other transistors of the 6T-SRAM cell could be properly sized for improved read stability and write-abilityen_US
dc.identifier.issn19729283
dc.identifier.otherDOI: 10.1049/iet-cds.2019.0307
dc.identifier.urihttps://ieeexplore.ieee.org/document/9139598
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/5980
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.relation.ispartofseriesIET Circuits, Devices and Systems, 14(4);PP. 555-561
dc.subjectSizingen_US
dc.subjectCMOS 6T-SRAM cellen_US
dc.subjectNBTI ageing mitigationen_US
dc.titleSizing of the CMOS 6T-SRAM cell for NBTI ageing mitigationen_US
dc.typeArticleen_US

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