A new method of oxide charges densities determination using Charge-Pumping technique in MOS structures

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dc.contributor.authorBentarzi, Hamid
dc.contributor.authorZitouni, Abdelkader
dc.contributor.authorKribes, Youcef
dc.date.accessioned2018-03-06T08:14:01Z
dc.date.available2018-03-06T08:14:01Z
dc.date.issued2008
dc.identifier.isbn978-960-6766-65-7
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/4584
dc.language.isoenen_US
dc.publisherWorld Scientific and Engineering Academy and Societyen_US
dc.relation.ispartofseriesWSEAS International Conference. Proceedings. Mathematics and Computers in Science and Engineering/ N°7 (2008);pp. 36-39
dc.subjectOxide chargesen_US
dc.subjectCharge pumping techniqueen_US
dc.subjectBias thermal stress techniqueen_US
dc.subjectFlat-band voltageen_US
dc.subjectOxide chargeen_US
dc.subjectMobile ionic charge densityen_US
dc.subjectOxide trapped charge densityen_US
dc.titleA new method of oxide charges densities determination using Charge-Pumping technique in MOS structuresen_US
dc.typeOtheren_US

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