Charge Pumping,GeometricComponent and Degradation ParametersExtraction in MOSFETDevices

dc.contributor.authorTahi, Hakim
dc.contributor.authorTahanout, Cherifa
dc.contributor.authorDjezzar, Boualem Djezzar
dc.contributor.authorBoubaaya, Mohamed
dc.contributor.authorAbdelmadjid, Benabdelmoumene
dc.contributor.authorChenouf, Amel
dc.date.accessioned2021-01-20T09:29:33Z
dc.date.available2021-01-20T09:29:33Z
dc.date.issued2015
dc.description.abstractIn this paper, we model the geometric component of charge pumping technique (CP). Base on this proposed model, wehave established ananalyticequation for charge pumping current. This equation seems to be an universal one since it is in agreement with CP experimental data of different technologies devices.Instead the classical considerations regarding a parasitic nature of the geometric component, we have demonstrated, in this work, that it can be used to estimate the negative bias temperature (NBTI)induced mobility degradationusing the charge pumping basedmethods such as on-the-fly interface trap (OTFIT).en_US
dc.identifier.otherDOI: 10.1109/TDMR.2015.2484620
dc.identifier.urihttps://ieeexplore.ieee.org/document/7293187
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/6186
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.relation.ispartofseriesIEEE Transactions on Device and Materials Reliability ( Volume: 15, Issue: 4, Dec. 2015);p.p. 567 - 575
dc.subjectCharge pumping (CP)en_US
dc.subjectGeometric current (IGeo)en_US
dc.subjectMobility degradationen_US
dc.subjectNBTIen_US
dc.titleCharge Pumping,GeometricComponent and Degradation ParametersExtraction in MOSFETDevicesen_US
dc.typeArticleen_US

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