Sputter deposition of titanium and nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by rutherford backscattering spectrometry

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dc.contributor.authorSalhi, M.
dc.contributor.authorAbaidia, Seddik-El-Hak
dc.contributor.authorMammeri, S.
dc.contributor.authorBouaouina, Boudjemaa
dc.date.accessioned2017-06-05T10:54:07Z
dc.date.available2017-06-05T10:54:07Z
dc.date.issued2017
dc.identifier.issn0040-6090
dc.identifier.urihttps://dspace.univ-boumerdes.dz/handle/123456789/3758
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofseriesThin Solid Films/ Vol.629 (2017);pp. 22-27
dc.subjectOptical emission spectroscopyen_US
dc.subjectMagnetron sputteringen_US
dc.subjectRutherford backscattering spectrometryen_US
dc.subjectGas pressureen_US
dc.subjectPower densityen_US
dc.subjectAverage deposition rateen_US
dc.titleSputter deposition of titanium and nickel thin films in radio frequency magnetron discharge characterized by optical emission spectroscopy and by rutherford backscattering spectrometryen_US
dc.typeArticleen_US

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