Metal-assisted electroless etching of silicon in aqueous NH 4HF 2 solution

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dc.contributor.authorBrahiti, Naima
dc.contributor.authorBouanik, Sihem-Aissiou
dc.contributor.authorToufik Hadjersi, Toufik
dc.date.accessioned2015-06-14T09:11:18Z
dc.date.available2015-06-14T09:11:18Z
dc.date.issued2012
dc.identifier.issn01694332
dc.identifier.urihttps://dspace.univ-boumerdes.dz123456789/1722
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofseriesApplied Surface Science/ Vol. 258, N°15 (2012);pp. 5628-5637
dc.subjectSilicon nanostructuresen_US
dc.subjectSilicon nanowiresen_US
dc.subjectMetal-assisted electroless etchingen_US
dc.subjectCatalysten_US
dc.subjectChemical depositionen_US
dc.subjectElectrolessen_US
dc.subjectElectroless chemical etchingen_US
dc.subjectEtching parametersen_US
dc.subjectEtching processen_US
dc.subjectEtching solutionsen_US
dc.subjectEtching temperatureen_US
dc.subjectNew solutionsen_US
dc.subjectP-type siliconen_US
dc.subjectSilicon surfacesen_US
dc.subjectSilicon substratesen_US
dc.titleMetal-assisted electroless etching of silicon in aqueous NH 4HF 2 solutionen_US
dc.typeArticleen_US

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